Fast, Consistent Solenoid for Atomic Layer Deposition
TLX developed a two-position, three-way pilot valve with performance tailored for ALD applications, including ultra-fast response, high operating temperature and compact design.
Customer Problem
Atomic layer deposition (ALD) films are applied in uniform, thin layers with atomic-level, repeatable control and complete conformity. A pulse of inert gas separates each dose of reactive chemicals, purging the chamber in preparation for the next application. The deposition process required a solution that could operate quickly through the cycles, under maximum pressure and temperature, while maintaining consistency over an extended life (>100 million cycles).
The TLX Solution
The ALD application cycle requires multiple doses of reactive chemicals to be delivered sequentially into the processing chamber. TLX developed a two-position, three-way pilot valve with performance tailored for ALD applications, including ultra-fast response, high operating temperature and compact design. The component used minimal power, making it more cost-effective than competing designs.
- Operating voltage
- 12 to 30 Vdc
- Operating pressure range
- 0 to 500 kPa
- Operating temperature
- -40 to 200°C
- Operating frequency
- 100-300 Hz
- Resistance
- 48 +/- 4.8 ohms @ 20°C
- Inductance
- 68.6 mH
- Flow Rate
- 35 l/min @ 80 kPa
- Leak Rate
- < 2 cc/min
- PWM pressure control
- 10-90% duty cycle
- PWM vacuum control
- 10-90% duty cycle
- Response time
- < 6 ms
- Burst pressure
- 50 bar
- Vibration
- 20 G
All TLX components are customized to fit system requirements, meaning technical specifications are unique to each customer and design. Examples given on our website are for illustration purposes only.
Working with TLX
- Experienced partner of industry leaders, first-tier suppliers, and OEMs
- Direct access to our design and engineering team
- Localized production in USA and China
- Dependable single-source solution from design to delivery
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